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Atmospheric pressure plasma for surface engineering applications

The aim is to develop the understanding of RAP technology to etch metals, such as Ti64, at atmospheric pressure

Student

Alex Bishop

Project overview

An atmospheric pressure plasma approach could dramatically cut processing times and costs as there wouldn't be a need to pump down the environment to low (vacuum) pressure. Current techniques such as: laser modification, vacuum plasma etching, CVD/PVD (Chemical/Physical Vapour Deposition), SPDT (Single Point Diamond Turning) or Electrolysis based methods all have drawbacks when processing high value metal parts, such as: high running costs, expensive tool replacements, long processing times or involve the use of harmful chemicals. The use of an atmospheric pressure plasma system could provide a cheap, fast process of etching metal parts with high surface finish and form accuracy, for use in metal optics or aerospace components.

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