Atmospheric pressure plasma for surface engineering applications
The aim is to develop the understanding of RAP technology to etch metals, such as Ti64, at atmospheric pressure
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Project overview
An atmospheric pressure plasma approach could dramatically cut processing times and costs as there wouldn't be a need to pump down the environment to low (vacuum) pressure. Current techniques such as: laser modification, vacuum plasma etching, CVD/PVD (Chemical/Physical Vapour Deposition), SPDT (Single Point Diamond Turning) or Electrolysis based methods all have drawbacks when processing high value metal parts, such as: high running costs, expensive tool replacements, long processing times or involve the use of harmful chemicals. The use of an atmospheric pressure plasma system could provide a cheap, fast process of etching metal parts with high surface finish and form accuracy, for use in metal optics or aerospace components.